Photoresist monomers serve as fundamental raw materials for the preparation of photoresists. High-barrier photoresist monomers exhibit a significant profit margin. Electronic-grade tert-butoxystyrene, functioning as a specialized photoresist monomer, demonstrates substantial potential for market development.

Tert-butoxystyrene, also referred to as 4-tert-butoxystyrene and abbreviated as VPBO or TBS, is an organic compound. Its molecular structure comprises a benzene ring with a tert-butoxy group at the para position and a vinyl group attached to the benzene ring. Under standard temperature and pressure conditions, tert-butoxystyrene appears as a colorless liquid with low volatility.

Tert-butoxystyrene exhibits unique properties, including electrical, optical, and magnetic characteristics, enabling it to be applied in a wide range of terminal scenarios. It serves as a synthetic precursor for novel resin materials, polymer materials, and advanced flame-retardant materials. Through free radical polymerization, tert-butoxystyrene can be utilized to synthesize polymer materials with excellent corrosion resistance and thermal stability, which find applications in optics, electronics, construction, and decoration industries. Additionally, tert-butoxystyrene possesses certain biocompatibility and biodegradability, making it suitable for the preparation of osteogenic materials and as a pharmaceutical intermediate in medicinal synthesis.